The ULVAC SIV-500 is a compact, high-performance magnetron sputtering system designed for depositing transparent conductive oxide (TCO) films such as Indium Tin Oxide (ITO) & with Aluminum (Al). Engineered for R&D labs, small-scale production, and device prototyping, the SIV-500 provides stable vacuum conditions, uniform thin-film deposition, and versatile process control. The unit supports metallic and dielectric sputtering and is known for exceptional reliability and low operating cost. It is complete with vacuum pumps, cryo pumps, turbo pumps, water pumps, helium compressors, and umbilicals. It is in excellent complete known working condition.
| Control | CNC (PLC) | CNC (PLC) |
| Dimensions | 200 | 200 |
| Weight | 125000 | 125000 |
The ULVAC SIV-500 is a compact, high-performance magnetron sputtering system designed for depositing transparent conductive oxide (TCO) films such as Indium Tin Oxide (ITO) & with Aluminum (Al). Engineered for R&D labs, small-scale production, and device prototyping, the SIV-500 provides stable vacuum conditions, uniform thin-film deposition, and versatile process control. The unit supports metallic and dielectric sputtering and is known for exceptional reliability and low operating cost. It is complete with vacuum pumps, cryo pumps, turbo pumps, water pumps, helium compressors, and umbilicals. It is in excellent complete known working condition.
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